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Setting up focus drilling with HyperLith
Hyperlight 90-Second User Guide
HyperLith Tutorial #2 - Yellow Fields, Formulas, Variables and Batching
HyperLith Tutorial: EUV Mask Inspection at 193nm
Custom Resist Model Plug-in for HyperLith
HyperLith Tutorial #6 - Multiple Sites in a GDS Layout
HyperLith Tutorial #4 - Biasing a Line Through Pitch
HyperLith Tutorial #8: BARC thickness optimization example (old)
Using SOAPI to get data from HyperLith output
Double Exposure Lithography Simulation with HyperLith
HyperLith Case Study: Focus Shift vs Pitch
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Last Updated: September 30, 2026
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Summary
A general, quick introduction to the In this series of videos we're going to tune a resist parameter set we're going to The line/space pattern is parameterized with two variables, 'pitch' and 'cd'. Simulated CD is plotted in different ways with respect ... The "image averaging" option in Yellow fields can have formulas that refer to variables. Variables can take on multiple values. When variables with multiple values ... You can write your own resist models in Python and use them as a plug-in to The GDS-Multi-site mask pattern lets users choose multiple sites to simulate. A 32nm line is simulated at five different pitches. At each pitch a bias is sought to cause the line to print at 32nm. The BARC thickness is traditionally optimised by observing the reflectivity from the BARC as viewed from the resist. In this video ... The Panoramic API (aka SOAPI/apiserver) is used to load an .hlin file, run the simulation and fetch the aerial image and resist ... 45nm lines through pitch are simulated with various mask models. The DOF and focus shift are observed.